The floating zone technique is an innovative and crucible-free method employed in materials science and crystal growth. In this process, a feed rod's tip is exposed to intense heat generated by heating source (Halogen lamps/Induction RF coil/Resistive Heater) until it melts. The molten portion of the feed rod is then carefully brought into contact with a seed rod, positioned just below the feed rod. This controlled interaction initiates the growth of a crystal, resulting in a single crystal structure with remarkable purity and quality.
Key advantages of the floating zone technique include its ability to produce high-quality single crystals with minimal impurities. The absence of a crucible eliminates contamination risks, making it ideal for applications in semiconductor technology, superconductors, and various advanced materials. This method offers precise control over crystal growth and is a valuable tool for researchers and industries seeking to harness the benefits of single crystal structures for their specific applications.
|Product name||Float zone system with optical hot zone||Float zone system with inductive hot zone||Float zone system with resistive hot zone|
|Translation (Top & Bottom)||400mm||400mm||400mm|
|transtation rate||00.01-150mm (Hr & Min)||00.01-150mm (Hr & Min)||00.01-150mm (Hr & Min)|
|rotation speed||0.1 To 50RPM[Cw/Ccw]||0.1 To 50RPM[Cw/Ccw]||0.1 To 50RPM[Cw/Ccw]|
|panel & pc control||yes||yes||yes|
|height adjustable moving plates||yes||yes||yes|
|Vibration Level||Very Minimal Level(0.015 to 0.08) g rms||Very Minimal Level(0.015 to 0.08) g rms||Very Minimal Level(0.015 to 0.08) g rms|
|Heater||Optical heating system||Inductive heating system||Resistive heating system|